International Journal of Electronics and Electrical Engineering IJEEE

ISSN: 2231-5284

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IJEEE

EFFECTS OF A BARRIER LAYER IN INGAAS CHANNEL MOSFETS FOR ANALOG/ MIXED SIGNAL SYSTEM-ON-CHIP APPLICATIONS


SUCHISMITA TEWARI
Dept. of Radio Physics and Electronics, University of Calcutta, Kolkata, India

ABHIJIT BISWAS
Dept. of Radio Physics and Electronics, University of Calcutta, Kolkata, India

ABHIJIT MALLIK
Dept. of Electronic Science, University of Calcutta, Kolkata


Abstract

Addition of a barrier layer in an InGaAs MOSFET, which shows promise for high performance logic applications due to enhanced electron mobility, further improves the electron mobility. We report, for the first time, a detailed investigation of the impact of different barrier layers on the analog performance of an InGaAs MOSFET. The device parameters for analog applications, such as transconductance (gm), transconductance-to-drive current ratio (gm/IDS), drain conductance (gd), intrinsic gain, and unity-gain cutoff frequency (fT) are studied with the help of a device simulator. A barrier layer is found to improve the analog performance of such a device in general; with a double-barrier layer showing the best performance.

Recommended Citation

[1] Y. Q. Wu, W. K. Wang, O. Koybasi, D. N. Zakharov, E. A. Stach, S. Nakahara and J. C. M. Hwang “0.8-V supply voltage deep-submocrometer inversion-mode In0.75Ga0.25As MOSFET”, IEEE Electron Device Lett., vol. 30, no.7, pp. 700-702, 2009.

[2] F. Xue, H. Zhao, Y.Chen, Y. Wang, F. Zhou, and J. Lee, “InAs inserted InGaAs buried channel metal-oxidesemiconductor field-effect-transistors with atomic-layerdeposited gate dielectric,” Appl. Phys. Lett., vol. 98, no.8, p.082106, 2011.

[3] F. Xue, A. Jiang, H. Zhao, Y. T. Chen, Y. Wang, F. Zhou, J. Lee, “Sub-50-nm In0.7Ga0.3As MOSFETs With Various Barrier Layer Materials”, IEEE Electron Device Lett., vol. 33, no.1, pp. 32-34, 2012.

[4] A. Lubow, S. Ismail-Beigi and T. P. Ma, “Comparison of drive currents in metal-oxide-semiconductor field-effect transistors made of Si, Ge, GaAs, InGaAs and InAs channels,” Appl. Phys. Lett., vol. 96, pp.122105, 2010.

[5] Y. Xuan, Y. Q. Wu and P. D. Ye, “High-performance inversion-type enhancement-mode InGaAs MOSFET with maximum drain current exceeding 1 A/mm”, IEEE Electron Device Lett, vol. 29, no.4, pp. 294-296, 2008.

[6] S.Tewari, A. Biswas and A. Mallik, “Study of InGaAschannel MOSFETs for analog/mixed-signal system-on-chip applications”, IEEE Electron Device Lett., vol. 33, no.3, pp. 372-374, 2012.

[7] ATLAS User’s Manual, A 2D Device Simulator Software Package, SILVACO Int. CA, (2010).

[8] I. Strzalkowski, S. Joshi and C. R. Crowell, “Dielectric constant and its temperature dependence for GaAs, CdTe, and ZnSe”, Appl. Phys. Lett., vol. 28, no.6, pp.350-352 , March 1976.

[9] O. G. Lorimar and W. G. Spitzer, “Infrared refractive index and absorption of InAs and CdTe”, J. Appl. Phys, vol. 36, no. 6, pp. 1841-1844, 1965.

[10] C. Carmondy, H. H. Tan, C. Jagadish, A. Gaarder and S. Marcinkevicˇius, “Ion-implanted In0.53Ga0.47As for ultrafast optoelectronic applications”, Appl. Phys. Lett, vol.82, no.22, pp.3919-3915, 2003.

[11] C. Pan, C. Wang, Y. Hsin, H. J. Zhu, J. M. Kuo and Y. C. Kao, “Current transport of GaAsSb-based DHBTs with different emitter structures”, Solid-State Electronics, vol.53, pp. 574-577, 2009.

[12] T. D. Lin, H. C. Chiu, P. Chang, Y. H. Chang, Y. D. Wu, M. Hong and J. Kwo, “Self-aligned inversion-channel In0.75Ga0.25As metal-oxide-semiconductor field-effecttransistors using UHV-Al2O3/Ga2O3(Gd2O3) and ALDAl2O3 as gate dielectrics,” Solid-State Electronics, vol.54, no. 54, pp. 919-924, 2010.

[13] W. Long, H. Ou, J-M. Kuo and K. K. Chin, “Dual-material gate (DMG) field effect transistor.”, IEEE Trans. Electron Devices, vol. 46, no.5, pp.865-870, 1999.

[14] J. Yuan and J. C. S. Woo, “A novel split-gate MOSFET design realized by a fully silicided gate process for the improvement of transconductance and output resistance”, IEEE Electron Device Lett., vol. 26, no.11, pp.829-831, 2005.

[15] S. Chakraborty, A. Mallik and C. K. Sarkar, “Subthreshold performance of Dual-Material Gate CMOS devices and circuits for ultralow power analog/mixed-signal applications”, IEEE Trans. Electron Devices, vol. 55, no.3, pp.827-832, 2008. 

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